Mentor Graphics releases platform for Samsung's 14nm IC manufacturing process
Dec 27, 2012 (Menafn - TELECOMWORLDWIRE via COMTEX) --Mentor Graphics Corp. MENT has announced comprehensive design, manufacturing, and post tapeout enabling support for Samsung's 14nm IC manufacturing processes, providing customers with a complete design-to-silicon flow concurrent with early process availability.
The fully interoperable Mentor flow helps customers achieve fast design cycles and first time silicon success.
The Mentor solutions optimized for Samsung's 14nm offerings include the Calibre platform with design rule checking, LVS checking, extraction, design for manufacturing and advanced fill, as well as the Tessent design for test suite and yield analysis tools.
Mentor Graphics Corp. is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronic, semiconductor and systems companies. The company's website is at http://www.mentor.com.
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